Seeley, Andrew J.; Price, Duncan M.; Knight, Gary P.; Abatement system. GB Patent Application 2,540,754 July 22 (2015)

Disclosed is an abatement system 10 for treating an effluent gas stream, the abatement system comprising a two stage liquid ring pump 20, each of the stages comprising respective gas inlets and gas outlets. An exhaust gas comprising compounds to be destroyed is passed through the two stage liquid ring pump such that the exhaust gas passes through the first stage 26 of the liquid ring pump 20 to a gas abatement device 22, following which it is passed to the second stage 28 of the liquid ring pump 20 for removal of the compounds formed in said abatement device. A gas inlet 30 of the first stage 26 is arranged to receive an effluent gas stream 12, the gas outlet 32 of the first stage 26 passes gas to the abatement system 22. A gas inlet 34 of the second stage 28 receives the gas from the abatement device system 22 and a gas outlet 36 of the second stage 28 exhausts gas to a facility 38 after the effluent gas stream has been treated by the second stage of the liquid ring pump. The invention allows for treating of a waste gas in sequence by a first stage of a liquid ring pump, an abatement system and a second stage of a liquid ring pump.

[back] [full text (1.09 MB)]