Bailey, Christopher; Tunna, Clive M. L.; Tattersall, Jack R.; Graham, Ingo S.; Czerniak, Michael R.; Knight, Gary P.; Mennie, Darren; Price, Duncan M.; Baker, Derek M.; Seeley, Andrew J.; Apparatus for evacuating a corrosive effluent gas stream from a processing chamber. US Patent 10,625,205 April 21 (2020)

Dry pumps are used to pump a variety of gas mixtures from the semiconductor industry. The present invention provides a liquid ring pump located between the dry pump and an abatement device to remove soluble corrosive materials prior to the exhaust gases entry to the abatement device, the work fluid exhausted from the liquid ring pump being separated from the gas prior to entry to the abatement device.

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